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Performance Dependences of Multiplication Layer Thickness for InP/InGaAs Avalanche Photodiodes Based on Time Domain Modeling

机译:基于时域建模的InP / InGaAs雪崩光电二极管倍增层厚度的性能相关性

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摘要

InP/InGaAs avalanche photodiodes (APDs) are being widely utilized in optical receivers for modern long haul and high bit-rate optical fiber communication systems. The separate absorption, grading, charge, and multiplication (SAGCM) structure is an important design consideration for APDs with high performance characteristics. Time domain modeling techniques have been previously developed to provide better understanding and optimize design issues by saving time and cost for the APD research and development. In this work, performance dependences on multiplication layer thickness have been investigated by time domain modeling. These performance characteristics include breakdown field and breakdown voltage, multiplication gain, excess noise factor, frequency response and bandwidth etc. The simulations are performed versus various multiplication layer thicknesses with certain fixed values for the areal charge sheet density whereas the values for the other structure and material parameters are kept unchanged. The frequency response is obtained from the impulse response by fast Fourier transformation. The modeling results are presented and discussed, and design considerations, especially for high speed operation at 10 Gbit/s, are further analyzed.
机译:InP / InGaAs雪崩光电二极管(APD)已被广泛用于现代长距离和高比特率光纤通信系统的光接收器中。对于具有高性能特征的APD,单独的吸收,分级,电荷和倍增(SAGCM)结构是重要的设计考虑因素。以前已经开发了时域建模技术,以通过节省APD研究和开发的时间和成本来提供更好的理解并优化设计问题。在这项工作中,通过时域建模研究了性能对乘法层厚度的依赖性。这些性能特征包括击穿场和击穿电压,倍增增益,过大噪声因子,频率响应和带宽等。针对各种倍增层厚度进行仿真,并具有一定的面积​​电荷片密度固定值,而其他结构和材料参数保持不变。通过快速傅立叶变换从脉冲响应中获得频率响应。给出并讨论了建模结果,并进一步分析了设计考虑因素,尤其是10 Gbit / s的高速操作。

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